• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    This invention is in concern of a method of and a device for adjusting a shaped-electron-beam working device which includes means for deflecting a shaped electron beam in the target plane and means for varying the shaped, preferably rectangular electron beam. The working device is adjusted with respect to the adjustment categories pupil, format or shape, and with respect to format calibration. The adjustment operations are performed substantially without any back-effects upon already obtained adjusted positions so that considerably short adjustment times are obtained. The inventional adjustment method provides a definite adjustment sequence for correcting aberrations visualized via display means, and also provides the device for performing the necessary steps. The invention is employed preferably in lithographic devices for producing microcircuits.
    公开号:SU940256A1
    申请号:SU787770391
    申请日:1978-12-19
    公开日:1982-06-30
    发明作者:Эберхард Хан
    申请人:Феб Карл Цейсс Йена (Инопредприятие)；
    IPC主号:
    专利说明:

    39 installation of an electron beam on a target with a deflecting arrangement system. The latter circumstance leads to the fact that the requirements for the alignment of electron optics with a flat bottom are much more varied compared to the requirements imposed on a point probe electron beam. When a mosaic composition of a pattern irradiated with a flat beam, defects in the butt zones of the irradiated mosaic can be obtained, if you do not care that each side of the electron beam cross section runs parallel to the x and y directions of the deflection of the deflecting system and has a length of front control (format calibration. In addition, the optical system is required to accurately focus the image of the crossover in the rotation plane of the deflection system of the format and its exact adjustment in the form of input pupil on the optical axis of the lens or on the aperture of the damping diaphragm, since this is an opening; in order to eliminate the parasitic background scattering, it should be chosen so small that it restricts the image of the crossover, and become possible to use it as an aperture diaphragm. of the GDR patent No., the principle of operation of an electron-optical device for irradiating an electron beam with a flat cross section and electronically optically controlled limitation of a light field, as well as assembly and device for aligning the pupil. The method of the device for adjusting the format and format calibration has not yet been described. The known electron optical means by which the electron beam is influenced in such a way that its parameters meet the requirements imposed on the electron beam in terms of intensity and format in the plane of the target have the disadvantage that their adjustment is difficult and takes a lot of time. In addition, with a known adjustment method, the question of whether or not there is astigmatism in the first intermediate image of the pupil cannot be unambiguously resolved. 6 The purpose of the invention is to increase the efficiency of the installation for electron beam processing, which operates according to the principle of a flat electron beam by reducing the alignment time. This creates the possibility of more frequent monitoring of the state of alignment, for example, after each exposure of the plate, due to which the rejects of manufactured products are reduced, and the requirements for the stability of electrical power are reduced to realizable limits. The object of the invention is to perform an optical system operating on the principle of an electron-optical aperture stop so that its adjustment is as simple as possible. 6, in particular, that the state of the optical system, characterized by such parameters as pupil adjustment, format adjustment and format calibration, is conveniently monitored, and the resulting deviations can be quickly and purposefully corrected. The proposed method of adjusting the installation for an electron beam treatment in which the first corner aperture is projected in the plane of the second additional corner aperture so that a substantially predominantly rectangular beam section is obtained which through the lens is displayed with a decrease on the target plane and is deflected along the x and y direction m, and in which the crossover of the beam forming system is projected onto the plane of rotation of the deflecting system and from there onto the plane of the aperture diaphragm (of the entrance pupil, the object a willow in which images of the electron beam cross section are formed in a time sequence; there are characteristic features that can be unambiguously attributed to the correcting parameters of the pupil adjustment, format adjustment and format calibration and which are corrected by setting the corresponding adjustment parameter to the specified position, moreover, this eliminates the mutual effects of the adjustment parameters by displaying the aperture diaphragm and focusing the pupil on the plane of the aperture diaphragm. afragmas in order to pre-adjust the pupil, displaying the target plane
    and cyclic placement of the zero format in the direction of deviation along the X axis and y on the target plane with a step width of zero format, followed by correction of the wedge shape visible at the edges of format 5, parallelogram error, removal error and different levels of clarity at four adjacent angles of zero format with The purpose of the alignment of the form-O in the beam. That is, the display of the aperture diaphragm and the cyclic positioning of the format in the direction of deviation both on the X axis and on the y axis in combination with the cyclic format change that occurs with a phase shift in the X and y direction, with subsequent correction of the resulting offset for the purpose of adjustment pupil, display of the target plane and cyclic placement of the format while simultaneously changing the format, as well as correction of the deletion error visible at the edges of the format for format calibration purposes. At the same time, after correction of the error from the wedge shape, an additional stage of adjustment is carried out, which consists in the fact that the aperture diaphragm is again displayed and the inconsistency visible at the pupil is eliminated. In addition, the angular aperture is displayed and the beam centering is rotated with rotation around the first angular aperture, and then the sides of the image of the first angular aperture are eliminated and the opposite chromatic difference of both sides in the image of the first angular aperture is eliminated. The implementation of the method is carried out using an adjustment device for an electron-beam processing apparatus comprising a first angle aperture, which is projected through a system of condensers into the plane of a second additional angle aperture, so that a limited, preferably rectangular, electron beam cross section is obtained, which is designed through an intermediate lens and objective lens. with a decrease on the target plane, and there it is deployed with the help of a deflection arrangement system, in which (device) a crossover si The beam shaping themes through the first condenser are projected into the plane of rotation of the two-level deflection system to change the format and from there through the second condenser and intermediate lens are projected into the plane of the aperture diaphragm of the lens, as well as the beam centering system to orient it to both the first angular aperture and the aperture diaphragm diaphragm or quench diaphragm and a number of stigmators, the first feature of the invention relates to the quantitative limitation of alignment parameters during current operation and devices. According to the invention, the size of the condenser system is selected in such a way that a certain adjustment condition is always fulfilled, namely, the display of the first angular diaphragm on the second, regardless of whether the other alignment was performed, namely the focus of the crossover image on the aperture diaphragm plane. For this, the distance Ct between the crossover and the first corner aperture, the distance b between the per. the angular aperture and the main plane of the first condenser in the space of the object, the distance C between the main plane of the first condenser in the image space and the main plane of the second condenser in the object space, the distance d between the main plane of the second condenser in the image space and the second angular aperture and distance in between the second angular aperture and the plane of the second intermediate pupil are selected from the relation -. a cH + b / aCNZ / e) - B The second characteristic of the invention relates to the correction n are parallel to the image side a first angular aperture in its conjugated zhennomu image in the second angular aperture. Fundamentally, it is possible to use for this the rotating effect of the image of capacitors, when one condenser is excited weaker and the second stronger. However, this method has the disadvantage of negative effects on several alignment parameters. Thus, among others, the pupil imaging inevitably defocused on the plane of rotation of the diverting Lormat system and also changes the scale of the map of the plane of the first aperture diaphragm to the plane of the second. According to the invention, in order to eliminate this drawback, a weakly excited coil is coaxially located between the condensers at the level of the first intermediate level. It does not adversely affect the focus and scale of the images and is effective only as a rotating lens, and the direction of deflection of the upper level to the lower deflection system of the format obviously also rotates. The third sign relates to the question of criteria for setting stigmators to compensate for astigmatism in the first intermediate pupil, the presence of which can negatively affect the formatting, and uniformity and constant intensity in the beam cross section when changing the shape of that. This feature is not directly detected, since the stigmatic mapping of the crossover in the plane of the second intermediate pupil and in the plane of the third intermediate pupil, i.e. the aperture plane of the fragment, is insufficient to assess the quality of the tuning criterion. In order to reveal this feature, a friend is offered, a coil stronger than the first intermediate pupil is located, and its excitation occurs when the stiggers are adjusted, so that between the plane of the first intermediate pupil and the plane of the second intermediate pupil is set alternately , for example, 13, fcoTopoe in accordance with a periodic change in the detected astigmatism in the aperture diaphragm plane alternates, if astigmatism is not compensated in the first Intermediate pupil. The fourth feature of the invention relates to the problem of combining the angles between the sides in the image of both the first angular aperture and the second angular diaphragm with the base yi, B1, which is the direction of the deviation along the X axis and in the deflection placement system, which is mostly straight angle, without interfering with the appropriate alignment process on the already adjusted states of the electron-optical image, in particular on the stigmatic image of the pupil. On the contrary, the compensation of the pupil matism should not have a negative reverse effect on the orthogonality of the beam cross section restriction. This problem is solved by the fact that a certain number of weakly excited quadruple in the condenser system is located and electrically connected in groups of two or several apropuli in such a way that, with an optically symmetric course of the main beam in the system of condensers, when the quadropule is excited in groups, their projected actions are enhanced, and collateral compensated. The fifth feature relates to the requirement of uniformity of sharpness at the edges and intensity in the beam section with an arbitrary format change within the regulated area of the format. The possibility of unevenness is associated with the lateral displacement of the crossover image in the aperture of the aperture diaphragm, which can be caused by various reasons. If the plane of the first intermediate pupil does not coincide with the plane of rotation of the deflection system of the format, then the pupil is displaced in the same (respectively) opposite direction in which the format opens or closes. By focusing the first intermediate pupil on the plane of rotation of the deflection system of the format, although it is possible to compensate for this component of pupil displacement, in general there is still a transverse component, the cause of which is the inaccurate deflection of the deflecting system. For example, there is no necessary fixed pivot point for all directions of deflection. In order to eliminate these drawbacks, in a deflecting system of the format, which consists of two lying in the direction of the beam propagation of the deflection levels, each deflection level contains two crossed deflection coils, the diverting currents of which and.,, Uy on the upper / y and on the lower /., - are exactly connected by the aloin transformation UK V (1) and., -,. moreover, the coefficients of the matrix a ,, and a
    13 are changed, for example, in the range of 0.9-li1 in order to establish the turning points of the format deviation along the x and y axes on the plane of the first intermediate pupil, and the coefficients of the matrix 5 and a, j. for example, they vary from -0.1 to +0.1 to rotate the direction of deviation of the upper level of deviation with respect to the direction of deviation of the lower level. О This device has the advantage that, firstly, the focusing of the crossover image on the plane of rotation of the deflection deflection system can have significant tolerances, and secondly, the reversal of the direction of deflection of the upper level, which occurs when correcting the parallelism of a rotating lens, can be easily compensated by a simple method.
    The sixth indication relates to format adjustment adjustment and calibration. format when using a projection imaging system, significantly 25 increasing the target plane when scanning on the fluorescent screen using a system that contains a switchable intermediate lens for displaying the plane of the target 30 or the plane of the entrance pupil on the fluorescent screen. Using a projection system, the format is cyclically placed on a plane in such a way that when the format is correctly adjusted and the format is calibrated, the surface is on average uniformly illuminated, the latter being congruent with the surface constructed by geometrical. 40 Transfer of format, while with incorrect adjustment or calibration of format on edges of cyclically placed format due to overlapping or separation appear light45 or corresponding dark areas, from which it is possible to determine the type of adjustment error, and with improper adjustment the pupil appears The brightness is also different in the four adjacent 50 corners of a cyclically placed format.
    FIG. 1 shows an electron-optical device for electron beam irradiation; in fig. 2 is a schematic for determining the dimensions of a capacitor system; in fig. diagrams showing the relationship between the sizing of the condenser system and the admissible excitation of the condenser for the case where the desired images of the angular diagrams and the crossover are stored; in fig. 6 -. Electron-optical device in accordance with the image; in fig. 7 and 8 are schematic diagrams of quad quad hive connections, respectively stigmators; in fig. - chart for explaining the alignment format; in fig. - Didiagram for explaining format calibration.
    As shown in FIG. 1, the source of the electron beam emitted from the crossover 1 is limited by two optically additional angular diaphragms 3 and 7. The excitation of the condensers and 6 is chosen so that, first, the angular aperture 3 is projected into the plane of the angular diaphragm 7 and - second, the crossover 1 is projected into the plane of the aperture diaphragm 10 by means of an intermediate lens 9, operating mainly at the maximum of the refractive power. At the same time, an intermediate image of the crossover (the first intermediate pupil) arises at the level of the mid-plane of the deflecting system 21, 22, in which plane 5 the virtual turning point of the deflecting system 21, 22 should also lie. If the sides of the angle aperture 3 include the right angle and also the sides corner aperture 7, then with a mechanically parallel installation on the basis of image wrapping predominantly equally excited, but switched on in opposite directions condensers 4 and 6, a rectangular section is obtained The beam in the plane of the angular aperture 7, which is projected with a decrease through the intermediate lens and objective 11, onto the plane of target 12. At the same time, it can be decomposed into two parts, the first part of which is the image of a mechanically stationary beam limitation, and - the image of the mechanically stationary limitation of the beam by the angular diaphragm 7, and neither the first part nor the second, taken separately, form a section, format. This format, besides the mechanical adjustment of the angular diaphragms and condensers, is set only by the field density of the deflection system /.1, 22 format and can be changed in two directions as the position of the beam cross section on the plane of the target 12, iiOTOpoe is set by means of a deflection accommodation system 13. Since both the deflecting system 13 and the deflecting system 21, 22 can be controlled by electric means, it is possible to place the electron beam on each arbitrary place inside the optically possible working field to set the cross section of 1ka to an arbitrary size within the optically possible format area , D / 1 I of obtaining a pre-programmed pattern on the target, a blanking system 19 is provided, which allows the image of the crossover to be brought into the plane of the aperture diaphragm 10 and rejected, thanks to In the plane of the target 12, the beam cross section is read in the form of a bright and a dark level. Since the beam aperture, the plane of the luminescent field of the angular aperture 7, is small compared with its aperture in the plane of the target in accordance with the image scale, the luminescent field is a target, a slight excitation of the damping system 19 will be sufficient for in order to probe the level without noticeably shifting the position of the electron beam on the screen and substantially changing its format. With the help of the second damping system damping system synchronously controlled with the system 19, 2 hours below the angle aperture 3, it is possible to ensure that the image of the beam restriction in the area of the angle aperture 3 on the target plane is not shifted during the unlocking or locking process. the possibility of accurate and very fast scanning of the light-dark levels on the target is achieved. Other electron-optical devices serve to automatically center the electron beam on the UF. Aperture 3 and aperture diaphragm 10, and measures the current to the beam in cross section and stigmatize mapping luminant field at the target plane. For this purpose, a double-anode double deflection system 26, 27 is provided for centering the electron beam on the angular aperture 3 with rotation around crossover 1 and for centering the image of the crossover, the third intermediate pupil., In the aperture of the aperture diaphragm with rotation of the angular diaphragm 3, and also deflecting system 17 for the complete deflection of the electron beam through the aperture diaphragm 10, for the purpose of measuring the beam current in the closed state, as well as stigmators 1 4 and 15 D. PJA for compensating astigmatism of the second and third order image of the light of the field on the target plane. In the electron-optical system, in addition, there are means by which it is possible to influence the electron beam in such a way that it has the desired intensity and format in the target plane. For this purpose, stigmators 18, 20, 23, and 25 and auxiliary capacitors 2 and 8 are provided. Among other means of adjustment, condensers 4 and 6 are also provided for this purpose, which are used to rotate the images of the angular aperture 3 with respect to the angular aperture 7, and intermediate lens 9) designed to rotate the format as a whole. Stigmators 20 and 25 serve to compensate for pupil astigmatism in plane 5 of the first intermediate pupil and in the plane of the aperture diaphragm 10, while stigmators 23 and 18 are designed to adjust the display of the angular apertures to the orthogonality of their sides. However, stigmatophi do not perform their tasks without adverse effects, for example, the stigmator 20 also acts on the vertex angle in the image of the angular diaphragm 3 as the stigmators 23 and 18 affect the pupil astigmatism. Adjusting stigmators in this way is difficult and time consuming. In addition, the known electron beam device does not have the means by which it is possible to decide whether or not there is astigmatism in the first intermediate pupil. The adjustment on the optical parallelism of the opposite sides of the section; the beam is required in order to be able to set the sides in the image of the angular diaphragm 3 parallel to the corresponding sides of the angular diaphragm 7. This is possible in principle if the excitations of both stigmators 23 and condensers 4 and 6 without changes in astigmatism of the pupil in the aperture diaphragm 10 and with the additional condition that the display of the yellow diaphragm 3 on the angular diaphragm 7 is preserved. On the basis of elliptical distortion, conditional by stigmators 2 and 23, you can change the vertex angle of both sides in the image of the angular aperture 3 and based on the rotation of the image, which is caused by both condensers and 6 with the opposite excitation change, can be rotated as a whole image of the angular aperture 3. However, inevitable axial displacement of the first and third intermediate pupil. Auxiliary condensers 2 and 8 are provided for eliminating these defocusings. The alignment processes described are primarily due to their many negative feedback effects, which are very complex and their implementation is laborious. In order to eliminate these drawbacks, a number of improvements are presented in the electron-optical system, which are explained in the following enclosed drawings. FIG. 2 shows the indications of the distances that are essential when sizing the condenser system according to the first feature of the invention. These distances are: distance C | between crossover 1 and angular aperture 3, distance b between the first angular diagonal fragment 3 and the main plane H of the sensor t in the space of the object, the distance C between the main plane H, the condenser k in the image space and the main plane H, the condenser 6 in the space of the object distance d between the main plane H; of the condenser 6 in the image space and the angular aperture 7 and the distance 6 between the angular aperture 7 and the plane 16 of the second intermediate pupil, which display with the intermediate lens 9 With an increase in the plane of the aperture diaphragm 10. As the main planes with small changes of excitation about condensers varying slightly, these five distances can be attributed to a discharge of almost mechanically fixed lengths. If now the system of condensers is chosen in such a way that the ratio D Mb / cd / cH-eq (b) a exists between them, then the region of excitation of both condensers is known, in which, when the crossover is displayed in the plane of the aperture diaphragm, 3 in the plane of the angular aperture 7. In FIG. Figures 3-5 show the functional relationship 28 between the excitation currents I. and 12 of both condensers f and 6 in the case when the angle diaphragm mapping is observed one after the other, and curve 29 shows the functional connection in the case when the crossover mapping is observed in the plane aperture diaphragm. If the discriminant D O, then according to FIG. 3, there is no excitation state for the condensers in which both displays are carried out simultaneously. If the discriminant is D o, then (fig. If) there are two specific excitation states, namely at the intersection points 30 and 31i in which simultaneous display is possible, however, from the fact that the pupil is focused on the plane of the aperture diaphragm, It clearly follows that the angular aperture is displayed on the plane of the angular aperture 7. This is ensured only when the excitation currents 1, I 2. The narrow zone 32 or 33- These zones are justified by the relatively large depth of field of the angular aperture display, which allows a certain tolerance for curve 28. When defining a system of condensers at 0 0 (Fig. 5), zone 3 is much wider than freedom of action for the excitation of capacitors , within which predominantly coarse adjustment on the parallelism of the display of the angular diaphragm and / or coarse adjustment of the first intermediate pupil to the plane of rotation of the deflecting axis can also be effected. Format topic. This feature is important as long as it establishes the range of values for the matrix coefficients of the coupling (1) of the rotating
    li.nzy 38 (fig. 6) in not too wide limits.
    For the purpose of sufficiently accurate selection of the distances at which, it is possible to provide a spacer cylinder 35, the height of which, under the circumstances, can be chosen empirically, if manufacturing tolerances cast doubt on the exact preliminary calculation. A single empirical determination is made using measured curves 28 and 29. From the splitting of which, it can be determined as in the case of FIG. 3 and t, according to a simple formula, changing the height of races of the stern cylinder 35. In order to determine the functional relationship between the excitation currents 1. and 2, which leads to curve 28, it is advisable to turn off the intermediate lens and, in addition, to artificially increase the aperture by swing beam centering 2b, 27 with rotation around the angular aperture 3. This adjustment is suitable for single pre-centering, but not for current operation (because of the time required for this). In addition, the symmetric displacement of the condensers 4 and 6 with the use of the intermediate ring 35 may also provide for the possibility of a general axial movement, which, for example, is achieved by changing the thickness of the intermediate washers in the fastening devices of the magnetic cores of the condensers and 6 without significantly reducing the adjustment made. Due to the total axial displacement, the difference between those excitations of condensers A and 6, at which crossover 1 is displayed both on the rotational plane of the deflecting system for changing the format 21, 22, and on the plane of the aperture diaphragm 10 (changing the difference of counter-activated excitations of the condensers means changing the angle rotation of the image of the globular diaphragm 3 in the plane of the angular aperture 7- This provides a rough adjustment of the sides of the angular diaphragms to the optical parallelism, so that the region of adjustment of the rotational Inza matrix 38 and connection Zb The necessity mA only for fine adjustment.
    In addition, it should be mentioned that the change in thickness of the washers, which
    cause both the same and opposite directions of the axial displacement of the condensers 4 and 6, can be represented as a linear combination of differences of unique definable excitations, which are established every time by one of four conditions: the display of the diaphragm 3 on the diaphragm with predominantly the same excitation C 12.1 the display of the diaphragm 3 on the diaphragm 7 when the sides are parallel in the image of the angular diaphragm 3 and 7. The display of the crossover 1 on the plane of the aperture diaphragm 10 is mostly the same in excitation 1, the mapping of .crosser 1 on the plane of the aperture diaphragm 10 at the invariance of the pupil in relation to the variation of the format.
    The elements of the device for implementing the method are schematically shown in FIG. 6 and 7. These include a rotating lens 38, a rotating swing lens 39, connected one after the other in antiphase. A pair of 40 stigmators 25 and 18, switched on one after another in antiphase of the vapor And stigmators 18, switched on one after another in antiphase. a quadropulary pair of k2, a quadropulse of synchronously connected, one after another pair of 4 stigmators 23 and 20 and a matrix 36 of communication. The rotating lens is an air-core coil with several layers, for example, one hundred turns, which are wound on the inner cylinder of the housing,
    the deflecting system for the format is symmetrical about the median plane. With a maximum current of up to 100 mL and an accelerating voltage of, for example, 30 k8, this lens rotates up to +3 images of the angular diaphragm 3 in the plane of the angular diaphragm 7.
    权利要求:
    Claims (3)
    [1]
    When it is located in the plane 5 of the first intermediate pupil in this excitation range, there is practically no defocusing of the second (respectively third) intermediate pupil. The only side effect is to rotate the direction of the deviation of the upper level 22 of the deviation of the format system, which leads to lateral deviation of the pupil when changing the format, but which can be simply compensated by using the 3 link matrix (matrix coefficients, 11). for deflecting currents, which did not appear during the alignment process, to the parallel display of the angle diaphragms, since the format deflection system is de-energized. The communication matrix 36 also performs another function, namely, precisely setting the plane of rotation of the format deflection system onto the plane 5 of the first intermediate pupil, which is carried out using the matrix coefficient a, for deflecting by x-direction and matrix coefficient a by y-direction. So far, this condition has been fulfilled by an auxiliary condenser 2 (FIG. 1, which can be eliminated by the same.) Similarly, an auxiliary condenser 8 is unnecessary, since, based on the choice of the sizes of the condenser system when focusing the pupil on the aperture diaphragm plane, excitation of the condenser, in which, as follows from Fig. 5, the inevitable mapping of the angular diaphragm on the plane of the angular diaphragm 7 is also ensured. Symmetrically to the mid-plane deviation A rotating format lens is positioned around the rotating lens, approximately 5 times stronger than the rotating lens 38. This lens is designed to recognize the possible astigmatism of the first intermediate pupil and can be excited so that the image between the plane of the first intermediate pupil and the plane of the third intermediate pupil or the plane of the aperture diaphragm changes, for example, to 1: 15 °. The criterion that the image of the first intermediate pupil is stigmatic is is observed when the rotating wobble lens 39 constancy astigmatism in the pupil plane or aperture stop, if so stigmatized pupil plane of the aperture, obtaining stigmatiches one display crossover in the aperture plane tee. In order to demonstrate in a simple way the implementation of the fourth feature of the invention, we assume that the choice of the sizes of the system of condensers occurs symmetrically with, which is described by the relation 9 618 a e, b - c. This has the advantage that when using a simple power source, stigmators (respectively, quad-bullets) can be of the same type U. Mostly they consist of four quadruplets (q, g, S, t) located on four concentric cylinders in the radial direction tightly above each other. Each quadropule is formed from four symmetrically arranged in azimuth and correspondingly included saddle-shaped deflecting coils with the same number of turns. In this case, two quadrupoles lie azimuthally in parallel, and both pairs of quadropulles are azimuthally rotated towards each other (5. The electrical connections of a system of four quadrupoles are separated separately and connected in pairs with the quadrupoles of the other system of four quadropules according to a certain pattern, which is shown in FIG. 7 and as follows: To understand the switching principle, Fig. 8 shows a typical course of the two main solutions r and c of a paraxial differential equation. The main curve has zero values at points 3 and 7 of the corner diaphragms 3 and 7, and the main curve is zero values at the intersection points with axis 1 of the crossover 5 of the first intermediate pupil and at point 16 of the second intermediate pupil, which is associated with the point on the axis of the aperture diaphragm 10 through the intermediate lens 9 expressing the integral of the action for matism and elliptic distortion of weak quadropular fields, these basic curves appear as multipliers. The integrand expression for pupil astigmatism contains Gl as a multiplier, and a subintegral The expression for the elliptical distortion of the display of the angular aperture contains, as a multiplier, the product G. Every time two quadruples lying along the optical axis are connected one after the other in one direction (respectively in the opposite so that they are strengthened in one place and . To do this, it is necessary that the quadropulums of different systems connected to a pair of quadropulles are directed azimuthally in parallel. The system of k quadropules (below as it is) is arranged as follows: iKC 25 lies at the same distance higher than the angular aperture 3, like 18 below the angular aperture 7. With the last iKC symmetrically to the middle, section C lies AKS37. Both 4Ks lie symmetrically to the midplane of the condensers and 6, Quadropul S KS 23 is connected in the same direction with quadropole 120. This pair of quadropels 23 + + B4KS20 creates astigmatism in the angle of the aperture 3 on the plane of the angular aperture 7. With a combination with the same rotated by 5 quadruple pairs -t 4X23 + -tlKCZO, a pair of stigmators 4 is obtained to compensate for the chromatic difference with respect to the display between the two angular diaphragms 3 and 7 without changing the elliptical distortion. As an additional effect, pupil astigmatism appears, which can be compensated by a pair of stigmators kO (respectively 4l). Quadropoul Of KC23 is connected in the opposite direction to Quad KP20. This kvadropulna pair (|, 4KS23, designated in Figure 7 numeral it2, creates an elliptical image distortion only in the corner aperture 3- Given rotate images condenser quasi ropulna azimuthally pair 2 is set so that the major axis of the ellipse coincides with the bisector of distortion angular aperture. Astigmatism in the first intermediate pupil changes as an additional quadrupole pair 2, while it does not change in the second and third intermediate pupils. The quadrant S tKC25 connects back to 4C18 quadropulum direction. This quadcopulum pair of 54X25-4X18 creates astigmatism in the first intermediate pupil without affecting the second intermediate pupil. The combination with the same quadrant-turned quadropular pair SlKCZS-S KClS forms a pair of stigmators (O to compensate for astigmatism in the first intermediate pupil without changing astigmatism in the second and third intermediate pupils. In the secondary space there is an elliptical distortion that changes the vertical angles in the image of the angular diaphragms and can to be compensated by the quadrilateral Zkvadropul 5 4K37, indicated in FIG. 7, position 3, is parallel with its axis, respectively, perpendicular to the sides of the corner aperture 7, and serves to change the vertex angles in the display of corner apertures and thereby to orthogonalize the four sides of the beam section measured by the above mentioned means to the parallelogram shape. As an additional effect, insignificant astigmatism appears in the second and third intermediate pupil, which can be compensated without negative reversal with the help of a stigmatop pair | 1. Kpadropul () 4X18 is connected in the opposite direction to the quadropulus C |, / tKC 37. This quadropulatory pair creates pupil astigmatism in the fifth intermediate pupil without additional effect, i.e. without elliptical distortion of the display of the angular aperture. The combination with the same quadrilateral 4X1 8Y + KC37 rotated on A5 forms a pair of stigmators k to compensate for pupil astigmatism in the second and third intermediate pupils of changing the angular position of the sides in the image of the angular diaphragms without changing the direction of the four sides of the beam section. According to the sixth feature of the invention, the format is adjusted when observing an electron beam section in the plane of the target enlarged using the Z-forming system on the luminescent screen 55. This imaging system, by switching the intermediate lens 5b, also allows the aperture diaphragm plane to be displayed . It is assumed that the electron beam cross section in the de-energized state of the deflecting system of the format under these conditions, according to the appropriate mechanical and / or electrical pre-centering, has an approximately square format cross section with average side lengths which are approximately two times smaller than the maximum square sides. section format. The task of adjusting the format is to set the sides in the image of the angular diaphragms 3 and 7 in the plane of the target parallel to the corresponding, preferably perpendicularly to each other, stand X, directions of deviation of the deflecting system 13 of the placement. For this, the following actuators are provided: an intermediate lens 9, acting as a rotating lens for the General format, a quadropel k3, a rotating lens 38, and a quadropulary pair it2. The driving force is generated by an excitation current jump in a deflection arrangement for the X-direction and a periodic jump of the excitation current in a deflection system for the V Direction that is out of phase by 90 °. When the jump size is consistent with the zero format, an irradiation surface of approximately square section is thus obtained, which in general on the sides of contact between the four jumping zero formats, depending on the alignment state of the format, has more or less wide and bright light and dark zones. FIG. 9, none of the four sides is aligned in the direction of deviation of the diverting arrangement system 13. The twice-irradiated zones 6 are brighter than the merely illuminated areas of k7, which are separated from the unirradiated and therefore dark base A8. The non-parallelity of the limiting sides of the electron beam near the intersection of the junction (x,) E (respectively 51) in the image of the angular aperture 3 and 50 (respectively 52) in the image of the angular diaphragm 7 can be eliminated with the help of a rotating lens k2, and then the state adjustment shown in FIG. 0, for which there is a parallelism of the opposite sides + 9-52. Centering in the directions of deviation X nv occurs with the help of variable rotation of the image of the intermediate lens 9 and elliptical distortion of the quad rotor 3- With the achievement of the one shown in FIG. 11 states the format adjustment is completed and finally the 9 622 format calibration follows. This format calibration is based on an equation for controlling the format (x: Ffg, G) No.). The adjustable values (Nv, Ny) ensure that the sides of the zero format are precisely aligned to the magnitude of the abruptly deflected in the X direction (respectively, y) deviation of the deflection placement system, as shown in FIG. 12. Through the control vector of the format (fy .fyj changes Lormat. At the same time, when changing fx dU, the format changes exactly on dx, do O, and when changing Tu fx, the Oorglat changes exactly on dx - O, Y. For of this requirement, the 4v control vector is additively connected through the matrix to the current vector Eu Eu "the matrix coefficients of 1cu. ... 22 are set as follows. In the W position (Fig. 12), the zero format is shifted by -dx in the X direction the deviation positioning system 13, and for alignment, the format is opened onto DVx s as direction the deviation of the deflecting system of the format, among others, depends on the setting of the communication matrix (a ,, ... aJ and rotating -, 0 41 22 LENSES) Then the limiting lines of the beam 9, 51 in position 1U lie parallel to the limiting lines of the beam 50, 52 V the displacement image in position I and IV, respectively, and can be combined with the appropriate establishment of the matrix elements fa |. The process of setting the matrix coefficients t., boi, in which (Fig. 1) zero t ii. the format is shifted in position 1U by -D in the direction of deviation of the deflecting arrangement system and is opened to align the format with A. Obviously, the signs V, uX and g can be chosen in the opposite direction and the displacement test form a can be conducted in another direction. With appropriate selection of the test bias sequence (Lig.13 and 1 m can be combined with the test (Fig. 15). It is enough to consider the contacting zones inside the circle of the observation field 53 since this consideration already gives an unambiguous conclusion about the changes in the coefficients of the matrix (b ... b) format control, and comparing the strengths of the four 239 adjacent angles of the cyclically positioned format gives a conclusion about the pupil alignment. In the ustustirovanny state there appears a uniform bright field of observation. The freedoms are described below the adjustment process, which is negative from the negative effects, indicating the specific sequence of mappings across the cross section of the electron beam of its characteristic signs of deviations from the specified state and the parameters of the adjustment with which these deviations are corrected, 1. The display of the aperture diaphragm and the pupil focusing on this plane using regulating the excitation one after another, the excitation catches of the capacitors included and 6.
    2. Display of the plane of the target and the cyclic placement of the zero format. A sign of deviation is wedge-shaped defects (Lig. E), which are corrected with the aid of the A2 quadrant and the rotating lens 38. 3.Display of the aperture diaphragm and the inclusion of the rotary swing lens 39. A sign of deviation is the inconvenience of pupil astigmatism, which is eliminated by a pair of stigmators 0. This operation may be absent, 4, Displaying the target plane and cyclic format placement. Signs of deviation are parallelogram defects (Fig. 10), which are corrected by a quadro and an intermediate lens with rotating lens properties; 5.Display of the plane of the target and the cyclic placement of the format. The sign of deviation is the deletion error (Fig. 11D, which is corrected by the setting values Nj (, NV is an accurate setting of zero. 6.Display of the aperture diaphragm. The sign of deviation is pupil astigmatism, which is compensated by a pair of stigmators AND. 7.Display of the aperture diaphragm and cyclical of the format (Fig. 13 and the Sign of deviation are the longitudinal and transverse displacement of the pupil, which are corrected by the elements a (respectively h, and (respectively a) of the matrix B 3 communication). The display of the plane of the target and the cycle The physical location of the format is 6 4 according to Fig. 15- A sign of deviation is the deletion error, which is corrected according to Fig. 15 by the elements of the format control matrix B. .. .L-. jLi at the same process of alignment is over. quadrants 1-1U, adjacent in the middle of the field of observation, which represent the irradiance density D of the four large-format corners (Fig. 15, the position of the displacement (W). So far, the exemplary embodiments have been related to a device comprising a quenching diaphragm, the opening of which is chosen in such a way that it is also effective as an aperture diaphragm. If the background of the irradiation, besides the self-image of the crossover, is sufficiently low, then the aperture of the aperture diaphragm can be chosen large. The advantage in this, in particular, is that the sensitivity is reduced when adjusting the pupil. In this case, it is possible to artificially increase the aperture of the display of the angular aperture by swinging the centering of the beam 2b, 27 with rotation around the angular aperture 3 without disconnecting the intermediate lens 9, thereby increasing the sensitivity of the display of the angular aperture of the angular aperture plane 7. In this case, the intermediate ring 35 is matched so that when excitation of the switched on excitation coils of condensers 4 and 6 on the sharp mapping of the angular diaphragm 3 on the plane is set Angular aperture 7 inevitably displays a crossover in the optically optimal plane of the entrance pupil of the lens 11, which lies generally inside the field of the lens. In paragraphs 3 6 and 7 of the sequence of operations under the display of the aperture stop understand the display of the entrance pupil. In sequence 1-8, step 1 is replaced. The display of the angular diaphragms and the swing of the beam centering with rotation around the angular diaphragm 3. The deviation is signaled by the oscillation of the sides in the image of the angular diaphragm 3 which is eliminated by adjusting one after another, the excitation coils of the condensers turned on and 6 except for the positive chromatic difference of both sides in the image of the first corner aperture 3, then this chromatic difference is corrected using a pair of stigmators 4, Claim 1. The method of adjusting the setup for electronic The processing in which the first corner of the diaphragm is projected into the plane of the second additional corner of the diaphragm, so that a predominantly rectangular beam section is obtained, which is reduced by the objective onto the plane of the target with the help of a diminutive objective and t develops in directions X and. and the crossover of the radar system is projected onto the plane of rotation of the deflecting system to change the format and from there onto the plane of the aperture diaphragm of the lens, characterized in that in the time sequence on the luminescent screen the images of the electron beam in the plane of the target and the aperture diaphragm are formed adjustment parameters for a given position and exclude the mutual influence of adjustment parameters by displaying the aperture diaphragm and focusing the beam in the aperture plane diagonal of the target plane and cyclic zero-format R, the direction of the deviation along the X and N axes on the target plane with a width of zero, followed by correction of the wedge error, parallelogram error, deletion error and various levels corrected at the edges of the format luminance in the four adjacent corners of the zero format, the display of the aperture diaphragm and the cyclic format change, carried out with a phase shift in the direction and Y, followed by a correction wherein the displacement of the beam, a display plane of the target and placing a cyclic format at one time to change the format, and the offsets in the visible edges Format removing errors. size 2, the method of adjusting the installation for electron-beam processing according to claim 1, characterized in that after correcting the error from the wedge shape, an additional step of adjustment is performed, which consists in displaying the aperture diaphragm and eliminating the visible Astigmatism on the pupil.
    [2]
    3. The method of adjusting the installation for electron beam processing according to claim 1, characterized in that the display of the angular diaphragm and the swing of the centering of the beam with rotation around the first angular diaphragm 3 and then eliminate the oscillation of the sides in the image of the first corner of the diaphragm and the remaining opposite chromatic the difference of both sides in the image of the first angular aperture. . An adjustment device for an electron-beam processing apparatus containing a first angle aperture, which is projected through a system of condensers into the plane of a second additional angle aperture, so that a limited, mainly rectangular beam section is obtained, which is projected with a decrease on the target plane and there turns using a deflection assembly system, in 4 taps (the crossover system of the beam forming system through the first capacitor is designed into the plane of rotation of the two-level deflection system for changing and from there through the second condenser and intermediate lens to the plane of the aperture diaphragm of the lens, as well as the beam centering system for orienting it to the first angle aperture or blanking aperture, and a number of stigmators, acting on the beam, characterized in that the distance O between the crossover 1 and the first angular diaphragm 3, the distance b between the first angular diaphragm 3 and the main plane of the first condenser in the space ve subject, the distance C between the principal plane of the first condenser 4 in the image space and the principal plane of the second condenser 6 in the space
    [3]
    279
    the distance, d mec (the plane of the second condenser 6 in the image space) and the second angle aperture 7 and the distance e between the second angle aperture 7 and the plane 16 of the second intermediate pupil are selected from
    -4 b / c d / c (-1 Ie / a; and d / e) B,
    and between the condensers (, 6 is located rotating the lens of pollutants and in the system of condensers there are placed weakly excited quadropules, which are electrically regulated in groups, and each group mainly consists of two quadropules, which are located and connected to each other in such a way that when astigmatism is corrected, astigmatic action the first quadropole is equally directed with the astigmatic effect of the other, the elliptical distortion of one of the other compensates for the elliptical distortion of the other; distortion of the wedge-shaped defects distorting
    5628
    the action of one quadrupule is directed equally to the distorting action of the other, and the astigmatic action of one compensates for the astigmatic action of the other, except that the deflecting currents Uj (, ON; at the upper and lower deflection levels of the deflecting system 21, 22 of the Lohrmat are interconnected by affine transformation, and containing an electron-optical system S, Forming an image of the plane of the target 12 or the plane of the aperture diaphragm 10 on the luminescent screen 55 and containing a switchable intermediate lens 36.
    5. An alignment device for electron-beam processing according to claim k, which is different in that a rotating rotary lens 39 is mounted between the condensers and 6.
    Recognized as an invention according to the results of the examination carried out by the Office of the German Democratic Republic. D
    D
    but
    -z
    well a
    O d
    D
    , 7 °
    well a
    / R i
    D d
    ; /
    7
    3
    7
    Hf H, 7
    FIG. 2
     /
    2
    fie.j
    7,
    "G
    Ug
    Phie 5
    Li i
    Oh
    CC
    "
    "G1
    "W-w
    HE
    4U
    I6
    t
    D
    5s
    Fig 6
    "3 - flJ
    D} / y
    fW. 7
    Fi9.v
    5L
    51
    50
    FIG. eleven
    II
    I
    // 7
    / U
    FIG 12
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    同族专利:
    公开号 | 公开日
    DD134582A1|1979-03-07|
    FR2415367A1|1979-08-17|
    US4393310A|1983-07-12|
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    DE19827819C2|1998-06-17|2003-07-03|Equicon Software Gmbh Jena|Process for controlling electron beam exposure systems using the shape beam principle|
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    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    DD78203296A|DD134582A1|1978-01-19|1978-01-19|METHOD AND DEVICE FOR ADJUSTING AN ELECTRON BEAM PROCESSING SYSTEM|
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